预移相型恒温热线(膜)流速计的动态响应方程

分析传统恒温热线热膜流速计(简称 HWFA)动态方程后,提出了一种新型HWFA 线路模型——主电桥预移相模型,推导出真实条件下小扰动动态响应方程,并按此原理设计制造了崭新的高性能 IFV—900型 HWFA 样机。该机全部革除了传统HWFA 的三个调节参量,大大地简化了调节步骤;不自激振荡的范围明显增宽,极大地减少了使用上的麻烦;频带宽度比当今世界流行的 HWFA 增宽了2～5倍;加上一系列智能化功能后使自动化程度达到了新的高度。这一新型 HWFA 的问世将可能导至 HWFA技术的重大改进和新的变革。首先阐明主电桥预移相模型的提出和真实条件下小扰动动态响应方程的推导。随后将用若干姐妹篇阐明动态方程频率响应调节元物理值的解析解,频率特性实验分析手段的电扰动试验响应情况的理论分析等内容。     

Kevlar/Nomex蜂窝夹层结构表面粘贴镀铜箔聚酰亚胺薄膜的工艺研究

文章对Kevlar面板Nomex蜂窝夹层结构表面粘贴镀铜箔聚酰亚胺薄膜的工艺进行了研究,分析了工艺特点、工艺流程、工艺难点,以及针对工艺难点所采取的工艺措施,最后根据产品的研制情况给出结论。     

从应变计现状看电阻式传感器的前景

电阻式传感器的核心部件——电阻应变计是目前最常用的应力分析的敏感元件。也常用于测量力、压力、扭矩和加速度等物理量。作者简要回顾了电阻应变计的发展历史，介绍了电阻应变计的结构、分类及现状，展望了电阻式传感器的前景。     

带管——罐式阻尼器卫星的章动衰减

本文利用能量法导出了带管——罐式阻尼器卫星章动衰减时间常数与系统参数的关系式;讨论了此类阻尼器中流体运动的自振频率和阻尼系数对卫星章动衰减时间常数的调节作用以及卫星惯量比与时间常数的关系。为设计此类章动阻尼器提供理论依据。     

光纤氢传感技术的研究现状及其应用前景

分析了光纤氢传感技术发展的现状和特点，比较了几种典型光纤氢传感器的结构和工作原理。指出了光纤氢传感技术是测量易爆环境下氢气浓度的有效方法，并对光纤氢传感技术的应用前景和有待解决的问题进行了讨论。     

数据格式转换技术在精密测量中的应用

叙述了为提高数据传输可靠性,在接收精密仪器所采集的数据过程中考虑将原有RS232串口通信,改进为USB接口通讯。但是接收到的信号出现了不明原因的周期性强干扰。为此,通过分析USB/RS232转换原理及A/D采集输出数据特点,对原软件的数据采集部分增补了具有特殊功能的子程序,使得应用程序可以自行恢复数据的完整性。此方法具有通用性,可在不同软件编辑环境中实现,且不影响硬件组成。文中又详细介绍了在薄膜厚度在线测量中应用上述USB接口通信的情况,实测结果表明试验取得了预想的效果。改进后的电容测量系统具有更为广泛的应用前景。     

非线性油膜支承裂纹转子振动特性分析

 以具有无限长轴承和无限短轴承支承的横向裂纹转子为研究对象,分析在非线性油膜力与横向裂纹联合作用时,Jeffcott转子的动力特性,并将其与刚性支承情况进行比较。结果表明轴承油膜力的存在对裂纹转子的振动影响较大,一般将降低转子的振动,这样势必增加转子裂纹故障诊断的难度。所以,在进行裂纹转子的故障诊断时,必须考虑到支承条件的影响,建立合理的动力学模型。     

气动参数对后台阶三维缝隙换热影响的研究

针对涡轮叶片尾缘冷却结构特点,建立了后台阶三维缝隙结构气膜冷却特性试验台,测量了缝隙中心和肋中心下游换热系数的局部分布,研究了不同雷诺数Re(5000~15000)与吹风比Br(0.5~2.0)对换热系数的影响规律,试验结果表明:(1)出口的换热系数总体呈下降趋势,但在肋后中心线略有起伏;(2)随着Re的增大,换热系数增大,随着Br的增大,换热系数减小;(3)在靠近出口位置,由于热边界层与三维掺混特性流场的影响,使得换热变得复杂。     

Microstructure and Optical Characterization of Magnetron Sputtered NbN Thin Films

Some fundamental studies on the preparation, structure and optical properties of NbN films were carried out. NbN thin films were deposited by DC reactive magnetron sputtering at different N2 partial pressures and different substrate temperatures ranging from –50 ℃ to 600 ℃. X-ray diffraction analysis (XRD) and scanning electron microscopy (SEM) were employed to characterize their phase com- ponents, microstructures, grain sizes and surface morphology. Optical properties inclusive of refractive indexes, extinction coefficients and transmittance of the NbN films under different sputtering conditions were measured. With the increase in the N2 partial pressure, δ-NbN phase structure gets forming and the grain size and lattice constant of the cubic NbN increasing. The deposited NbN film has relatively high values of refractive index and extinction coefficient in the wavelength ranging from 240 nm to 830 nm. Substrate tem- perature exerts notable influences on the microstructure and optical transmittance of the NbN films. The grain sizes of the δ-NbN film remarkably increase with the rise of the substrate temperature, while the transmittance of the films with the same thickness decreases. Ultra-fine granular film with particle size of several nanometers forms when the substrate is cooled to –50 ℃, and a remarkable aug- mentation of transmittance could be noticed under so low a temperature.     

Kinetic Monte Carlo Simulation of EB-PVD Film:Effects of Substrate Temperature

The 2D kinetic Monte Carlo (KMC) simulation was used to study the effects of different substrate temperatures on the microstruc-ture of Ni-Cr films in the process of deposition by the electron beam physical vapor deposition (EB-PVD). In the KMC model, substrate was assumed to be a “surface” of tight-packed rows, and the simulation includes two phenomena: adatom-surface collision and adatom diffusion. While the interaction between atoms was described by the embedded atom method, the jumping energy was calculated by the molecular static (MS) calculation. The initial location of the adatom was defined by the Momentum Scheme. The results reveal that there exists a critical substrate temperature which means that the lowest packing density and the highest surface roughness structure will be achieved when the temperature is lower than the smaller critical value, while the roughness of both surfaces and the void contents keep decreasing with the substrate temperature increasing until it reaches the higher critical value. The results also indicate that the critical substrate temperature rises as the deposition rate increases.